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diffusion furnace [1 record]
Record 1 - internal organization data 2008-02-18
Record 1, English
Record 1, Subject field(s)
- Printed Circuits and Microelectronics
- Industrial Techniques and Processes
Record 1, Main entry term, English
- diffusion furnace
1, record 1, English, diffusion%20furnace
correct
Record 1, Abbreviations, English
Record 1, Synonyms, English
- diffusion oven 2, record 1, English, diffusion%20oven
Record 1, Textual support, English
Record number: 1, Textual support number: 1 DEF
A furnace used to make junctions in semiconductors by diffusing dopant atoms into the surface of the material. 3, record 1, English, - diffusion%20furnace
Record number: 1, Textual support number: 1 CONT
Diffusion process systems are used in the manufacture of solid state devices for discrete as well as integrated circuit components. The end use of these products ranges from a single transistor in a portable radio to semiconductor memory used in computers. In the manufacture of typical integrated circuits, various elevated temperatures and gaseous atmospheres are required. Diffusion furnaces are operated at temperatures between 1000 to 1300 ° C. Thermal uniformity is critical in order to allow insertion of a large number of wafers into the furnace... Deposition systems, of which there are three (liquid, gaseous, solid), are used to deposit impurities on the silicon wafer. 4, record 1, English, - diffusion%20furnace
Record 1, French
Record 1, Domaine(s)
- Circuits imprimés et micro-électronique
- Techniques industrielles
Record 1, Main entry term, French
- four de diffusion
1, record 1, French, four%20de%20diffusion
masculine noun
Record 1, Abbreviations, French
Record 1, Synonyms, French
- four de diffusion thermique 1, record 1, French, four%20de%20diffusion%20thermique
masculine noun
Record 1, Textual support, French
Record number: 1, Textual support number: 1 DEF
Appareil dans lequel on chauffe les tranches de silicium à une température voisine de leur température de fusion (entre 900 et 1200 °C), en présence d'une vapeur dopante, en vue d'introduire des atomes d'une impureté dans la masse du semi-conducteur. 1, record 1, French, - four%20de%20diffusion
Record number: 1, Textual support number: 1 OBS
L'impureté se condense sur la surface de la tranche et diffuse ensuite dans l'épaisseur du substrat. 1, record 1, French, - four%20de%20diffusion
Record 1, Spanish
Record 1, Textual support, Spanish
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