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PHOTOCHEMICAL VAPOR DEPOSITION [1 record]
Record 1 - internal organization data 1982-06-22
Record 1, English
Record 1, Subject field(s)
- Aeroindustry
Record 1, Main entry term, English
- photochemical vapour deposition
1, record 1, English, photochemical%20vapour%20deposition
correct
Record 1, Abbreviations, English
Record 1, Synonyms, English
- Photo-CVD 1, record 1, English, Photo%2DCVD
correct
Record 1, Textual support, English
Record number: 1, Textual support number: 1 CONT
Hughes Aircraft is under contract to the US Air Force to demonstrate for use in manufacturing a new process that coats microelectronic devices with a silicon nitride insulating film, offering several key advantages over previous insulating techniques. Microcircuits are prepared for a reactor chamber designed for the photo-chemical vapour deposition (Photo-CVD) process. Developed by Hughes with company funds, Photo-CVD offers the potential of eliminating wire bond corrosion, device degradation due to leaky standard metal or ceramic hermetic packages, and failure due to loose conductive particles. According to the company, it is not destructive because it does not generate the ionized particles and broadband electromatic radiation encountered in Plasma-CVD and physical sputtering processes. 1, record 1, English, - photochemical%20vapour%20deposition
Record 1, Key term(s)
- photochemical vapor deposition
- photochemical vapour deposition process
- photo-CVD process
Record 1, French
Record 1, Domaine(s)
- Constructions aéronautiques
Record 1, Main entry term, French
- déposition de vapeur photochimique 1, record 1, French, d%C3%A9position%20de%20vapeur%20photochimique
Record 1, Abbreviations, French
Record 1, Synonyms, French
- Photo-CVD 1, record 1, French, Photo%2DCVD
Record 1, Textual support, French
Record number: 1, Textual support number: 1 CONT
(...) la société Hughes Aircraft effectue des travaux visant à démontrer la possibilité d'utiliser, pour la fabrication en série des microcircuits, le procédé de déposition de vapeur photochimique appelé Photo-CVD (photochemical vapour deposition). (...) ce procédé consiste à déposer un film isolant de nitrure de silicium, lequel évite la corrosion aux points de soudure des fils, les dégradations imputables à un manque d'étanchéité des boîtiers et les pannes pouvant être provoquées par des particules conductrices détachées. Le film ne provoque lui-même aucune détérioration, étant donné qu'il ne produit ni particules ionisées ni rayonnement électromagnétique à large bande comme c'est le cas avec le procédé Plasma-CVD et les méthodes classiques de pulvérisation. 1, record 1, French, - d%C3%A9position%20de%20vapeur%20photochimique
Record 1, Spanish
Record 1, Textual support, Spanish
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