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PECVD [1 record]

Record 1 2008-11-25

English

Subject field(s)
  • Electrical Engineering
OBS

Chemical vapor deposition (CVD) deposits atoms or molecules by reducing the decomposition of a chemical-vapor precursor species that contains the material to be deposited. The reduction is normally accomplished using hydrogen at an elevated temperature. Decomposition is accomplished by thermal activation. The use of a plasma allows the reduction or decomposition to be done at a lower temperature than using temperature alone.

Key term(s)
  • plasma-enhanced chemical vapour deposition

French

Domaine(s)
  • Électrotechnique
DEF

Technique de dépôt chimique de couches minces en présence d'un gaz partiellement ionisé, appelé plasma.

Spanish

Campo(s) temático(s)
  • Electrotecnia
CONT

La deposición de películas delgadas de materiales dieléctricos para separar eléctricamente partes de los dispositivos electrónicos a realizar es inevitable en la mayor parte de los casos. Una de las técnicas mejor establecidas para ello es la deposición en fase vapor asistida por plasma [...], que permite obtener dieléctricos con baja porosidad y uniformes en tallas laterales de sustrato grandes, conformes con la topología del sustrato, y con velocidades de depósito altas.

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