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GRAVURE ISOTROPIQUE [1 record]

Record 1 2026-03-10

English

Subject field(s)
  • Electronic Circuits Technology
  • Printed Circuits and Microelectronics
  • IT Security
CONT

Isotropic etching is an etching method which removes part of the substrate non-directionally ... resulting in round corners.

French

Domaine(s)
  • Technologie des circuits électroniques
  • Circuits imprimés et micro-électronique
  • Sécurité des TI
DEF

Gravure dont la vitesse d'attaque est la même dans toutes les directions à l'intérieur d'un substrat.

Spanish

Campo(s) temático(s)
  • Tecnología de los circuitos electrónicos
  • Circuitos impresos y microelectrónica
  • Seguridad de IT
CONT

El silicio es normalmente grabado con gases basados en flúor, cloro o bromo. Los plasmas basados en flúor, a diferencia de los demás halógenos, son generalmente usados para grabado isotrópico, ya que el flúor es la principal especie reactiva con silicio, por lo que el grabado se efectuará en todas direcciones.

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